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This pattern is designed for woven fabrics
such as cotton, cotton types, decorator fabric, denim, twill, corduroy.
Bags can be completely
sewn using a serger (overlock) machine or they may be sewn using a
standard sewing machine. Instructions included for both methods.
- VIEW A Bag is double, outside has
center panel from contrast fabric, and inside has side panels from contrast
fabric. Seams can be exposed or enclosed. Pattern cover image fabric by
RJR.
- VIEW B Bag is double and has shoulder
strap from contrast fabric. All seams are exposed or covered with bias tape.
Pattern Cover image thread by Mettler.
- VIEW C Bag is double, has shoulder
strap, and flap with button or snap closure. All seams are exposed or
covered with bias tape. Cover image fabric by Robert Kaufman.
- VIEW D Clutch purse is double, has
tucks on front, and flap with button or snap closure. Seams can be exposed
or enclosed.
DUAL
INSTRUCTIONS INCLUDED: SERGER (OVERLOCK) AND STANDARD SEWING MACHINES.
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